Title:
【発明の名称】ペンタフルオロプロペンの接触製造
Document Type and Number:
Japanese Patent JP2001509803
Kind Code:
A
Abstract:
A process is disclosed for the manufacture of a pentafluoropropene of the formula: CFX=CYCF3 where X is selected from H and F and where Y is F when X is H and Y is H when X is F. The process involves contacting a hexafluoropropane of the formula: CF2XCHYCF3 at a temperature of from about 200° C. to 500° C. with a catalyst, optionally in the presence of an inert gas. Suitable catalysts include (1) catalysts of (a) at least one compound selected from the oxides, fluorides and oxyfluorides of magnesium, zinc and mixtures of magnesium and zinc, and optionally (b) at least one compound selected from the oxides, fluorides and oxyfluorides of aluminum; provided that the atomic ratio of aluminum to the total of magnesium and zinc in said catalyst is about 1:4, or less (e.g., 1:9), (2) lanthanum fluoride, (3) fluorided lanthanum oxide, (4) activated carbon, and (5) three-dimensional matrix carbonaceous materials.
Inventors:
Nappa, Mario, Joseph.
Lao, Vi., N., Malika Luna.
Lao, Vi., N., Malika Luna.
Application Number:
JP53290498A
Publication Date:
July 24, 2001
Filing Date:
January 07, 1998
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
B01J21/18; B01J27/12; B01J37/08; C07B61/00; B01J27/06; C07C17/25; C07C21/18; (IPC1-7): C07C17/25; B01J27/06; C07C21/18
Domestic Patent References:
JP3158440B2 | 2001-04-23 | |||
JPH0967281A | 1997-03-11 | |||
JPS62169737A | 1987-07-25 | |||
JPH08510739A | 1996-11-12 |
Attorney, Agent or Firm:
Yoshikazu Tani (2 outside)
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