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Patent Searching and Data


Title:
【発明の名称】ガスのプラズマ処理装置
Document Type and Number:
Japanese Patent JP2001520109
Kind Code:
A
Abstract:
An apparatus (1) for the processing of gaseous media by means of a plasma wherein there is included at least one electrode (16, 14) which is maintained in position in relation to another by one or more insulating support structures (7, 8) made of a micaceous glass material.

Inventors:
Weeks David Michael
Seagull David Leslie
Application Number:
JP2000516758A
Publication Date:
October 30, 2001
Filing Date:
October 09, 1998
Export Citation:
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Assignee:
AA Technology Public Limited Company
International Classes:
F01N3/08; B01D53/32; B01D53/92; B01J19/08; (IPC1-7): B01D53/32; B01J19/08; F01N3/08
Attorney, Agent or Firm:
Minoru Nakamura (9 outside)