Title:
【発明の名称】電子放出粒子及び絶縁粒子を備えた電界放出陰極
Document Type and Number:
Japanese Patent JP2003506843
Kind Code:
A
Abstract:
Electrophoretic deposition provides an efficient process for manufacturing a field emission cathode. Particles of an electron emitting material mixed with particles of an insulating material are deposited by electrophoretic deposition on a conducting layer overlying an insulating layer to produce the cathode. By controlling the composition of the deposition bath and by mixing insulating particles with emitting particles, an electrophoretic deposition process can be used to efficiently produce field emission cathodes that provide spatially and temporally stable field emission. The deposition bath for the field emission cathode includes an alcohol, a charging salt, water, and a dispersant. The field emission cathodes can be used as an electron source in a field emission display device.
Inventors:
Russ, Benjamin, Yi
Ichiro Saito
Burger, jack
Ichiro Saito
Burger, jack
Application Number:
JP2001516210A
Publication Date:
February 18, 2003
Filing Date:
August 11, 2000
Export Citation:
Assignee:
Sony electronics ink
International Classes:
H01J1/304; H01J9/02; H01J29/04; (IPC1-7): H01J1/304; H01J9/02; H01J29/04
Attorney, Agent or Firm:
Akira Koike (2 outside)