Title:
ネガティブ化学増幅レジスト用ストリッパー組成物
Document Type and Number:
Japanese Patent JP2004506923
Kind Code:
A
Abstract:
The present invention relates to a nonaqueous stripper composition for negative chemically amplified resists which shows excellent removing capabilities, has anticorrosive effects on varieties of metallic substrate plates such as Al, W, TiN, WSi, SiON, SiNx, HTO, etc., improves productivity since it can be recycled as a nonaqueous stripper even after many applications, and is suitable in electronic material fields in which high precision processing is required in the negative chemically amplified resist removing process. The present invention provides a stripper composition for negative chemically amplified resists comprising a) 20 to 35 weight % of straight chained alkylbenzenesulfonic acid; b) 10 to 34 weight % of light aromatic naphtha solvent; c) 30 to 45 weight % of organic compounds containing chlorine; d) 15 to 25 weight % of hydroxybenzenes; and e) 0.5 to 5 weight % of polyoxyethylene octylphenylether derivatives, in order to accomplish the above objects.
Inventors:
Ochanyi
Lee Sandai
Yawson Sun
Lee Sandai
Yawson Sun
Application Number:
JP2001506757A
Publication Date:
March 04, 2004
Filing Date:
June 27, 2000
Export Citation:
Assignee:
Doujin Semichem Company Limited
International Classes:
C11D1/72; C11D3/18; C11D3/34; G03F7/42; G03F7/004; H01L21/027; H01L21/308; (IPC1-7): G03F7/42; H01L21/027; H01L21/308
Attorney, Agent or Firm:
Takao Suzuki
Koichi Kajisaki
Yuzo Ozaki
Toshihiko Taniguchi
Koichi Kajisaki
Yuzo Ozaki
Toshihiko Taniguchi