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Patent Searching and Data


Title:
半導体露光システム用干渉計システム
Document Type and Number:
Japanese Patent JP2004538471
Kind Code:
A
Abstract:
An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Inventors:
Novak W Thomas
Stambo debit
Fuyuhiko Inoue
Application Number:
JP2003519699A
Publication Date:
December 24, 2004
Filing Date:
August 07, 2002
Export Citation:
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Assignee:
NIKON CORPORATION
International Classes:
G01B9/02; G01B11/26; G03F7/20; G01B11/00; H01L21/027; (IPC1-7): G01B11/00; G01B11/26; H01L21/027