Title:
直接書き込み式ナノリソグラフィーによるナノスケールチップからの核酸の沈着方法
Document Type and Number:
Japanese Patent JP2005512032
Kind Code:
A
Abstract:
The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.
Inventors:
Markin Chad A.
Demas M. Lynette
Ginger David S.
Demas M. Lynette
Ginger David S.
Application Number:
JP2003549493A
Publication Date:
April 28, 2005
Filing Date:
December 02, 2002
Export Citation:
Assignee:
NORTHWESTERN UNIVERSITY
International Classes:
G01N33/53; B01J19/00; B01L3/00; B01L3/02; B82B3/00; C12M1/00; C12N15/09; C12Q1/68; C40B40/02; C40B50/06; C40B60/12; G01N37/00; G01Q60/24; G01Q60/38; G01Q60/42; G01Q80/00; G01Q90/00; G03F7/00; (IPC1-7): G01N33/53; C12M1/00; C12N15/09; C12Q1/68; G01N13/10; G01N13/16; G01N37/00
Domestic Patent References:
| JP2001272402A | 2001-10-05 | |||
| JPH07181191A | 1995-07-21 |
Foreign References:
| WO2000041213A1 | 2000-07-13 | |||
| WO2001000876A1 | 2001-01-04 | |||
| WO2001035100A2 | 2001-05-17 |
Attorney, Agent or Firm:
Hatsushi Shimizu
Kazunori Hashimoto
Koichi Niimi
Kazunori Hashimoto
Koichi Niimi