Title:
電子ビーム発生装置
Document Type and Number:
Japanese Patent JP2012506122
Kind Code:
A
Abstract:
An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.
Inventors:
Park, Yongwon
Park, Song Ju
Ko, Inn
Kim, Chang Bum
Hong, Juho
Moon, Song Ik
Park, Song Ju
Ko, Inn
Kim, Chang Bum
Hong, Juho
Moon, Song Ik
Application Number:
JP2011532032A
Publication Date:
March 08, 2012
Filing Date:
August 10, 2010
Export Citation:
Assignee:
POSTECH ACADEMY-INDUSTRY FOUNDATION
International Classes:
H01J37/073
Domestic Patent References:
| JP2000012300A | 2000-01-14 | |||
| JPH1123482A | 1999-01-29 | |||
| JPH06176723A | 1994-06-24 | |||
| JPS61206143A | 1986-09-12 | |||
| JPH10247598A | 1998-09-14 | |||
| JPH1145676A | 1999-02-16 | |||
| JPH0765707A | 1995-03-10 | |||
| JP2000012300A | 2000-01-14 | |||
| JPH1123482A | 1999-01-29 | |||
| JPH06176723A | 1994-06-24 | |||
| JPS61206143A | 1986-09-12 | |||
| JPH10247598A | 1998-09-14 |
Attorney, Agent or Firm:
Juichiro Yano