Title:
VAPOR DEPOSITION MASK SUBSTRATE, MANUFACTURING METHOD FOR THE SAME, MANUFACTURING METHOD FOR VAPOR DEPOSITION MASK AND MANUFACTURING METHOD FOR DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2019073761
Kind Code:
A
Abstract:
To provide a vapor deposition mask substrate, a manufacturing method for the same, a manufacturing method for a vapor deposition mask, and a manufacturing method for a display device capable of enhancing accuracy of a pattern formed by vapor deposition.SOLUTION: Cross sections of a metal plate along a width direction DW at respective positions in a length direction DL of the metal plate have shapes which differ from each other. Each cross section has a wavy shape with repetition of irregularities in the width direction of the metal plate. A length in the width direction DW on a surface of the metal plate is defined as a surface distance and the minimum value of the surface distances at respective positions in the length direction of the metal plate is defined as a minimum surface distance. Ratios of differences between the surface distance and the minimum surface distance at each position in the length direction of the metal plate to the minimum surface distance are defined as extension rates in the width direction. In the metal plate, a maximum value of the extension rates in the width direction is equal to or less than 2×10.SELECTED DRAWING: Figure 4
Inventors:
SHINNO MIKIO
Application Number:
JP2017199920A
Publication Date:
May 16, 2019
Filing Date:
October 13, 2017
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
C23C14/04; B21B1/40; C23F1/00; C23F1/02; G09F9/00; H01L27/32; H01L51/50; H05B33/10
Domestic Patent References:
| JP2014148743A | 2014-08-21 | |||
| JP2015055007A | 2015-03-23 | |||
| JP2017193775A | 2017-10-26 |
Foreign References:
| WO2017179719A1 | 2017-10-19 |
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda
Hironobu Onda