Title:
ELECTROLYTIC POLISHING LIQUID AND METHOD FOR MANUFACTURING PROCESSED METAL
Document Type and Number:
Japanese Patent JP2019090085
Kind Code:
A
Abstract:
To provide the electrolytic polishing liquid substantially free of phosphorus and nitrogen.SOLUTION: The electrolytic polishing liquid comprises at least following components (1) to (2), wherein the component (1) is at least one inorganic sulfonic acid or organic sulfonic acid or salts thereof, the component (2) is at least one monohydric or polyhydric alcohol, the electrolytic polishing liquid is substantially free of phosphorus and nitrogen, and the electrolytic polishing liquid has a pH of less than 2.SELECTED DRAWING: None
Inventors:
NAGASAWA SOHEI
KATORI MITSUOMI
SHIRAKAWA SHUHEI
KATORI MITSUOMI
SHIRAKAWA SHUHEI
Application Number:
JP2017220448A
Publication Date:
June 13, 2019
Filing Date:
November 15, 2017
Export Citation:
Assignee:
NIPPON HYOMEN KAGAKU KK
International Classes:
C25F3/00; C25F3/16; C25F3/18; C25F3/20; C25F3/24
Attorney, Agent or Firm:
Axis International Patent Business Corporation