Title:
DEPOSITION DEVICE AND DEPOSITION METHOD
Document Type and Number:
Japanese Patent JP2020017697
Kind Code:
A
Abstract:
To improve the productivity at the time of depositing by PEALD.SOLUTION: A deposition device that deposits a predetermined film on a substrate by PEALD includes a processing container that airtightly stores the substrate, and a mounting table that mounts the substrate in the processing container. The processing container includes an exhaust port that exhausts the inside of the processing container, an exhaust path connecting the processing region located above the mounting table and the exhaust port in the processing container, and a partition portion that separates the processing region side and the exhaust port side in the exhaust path. The partition portion has a flow path that connects the processing region side and the exhaust port side, and the partition portion is formed such that the exhaust port side is not seen from the processing region side in a plan view in a direction in which the exhaust path extends.SELECTED DRAWING: Figure 1
Inventors:
NAGAIKE HIROSHI
YOSHIKOSHI DAISUKE
FUNAKUBO TAKAO
IWASAKI MINEHISA
XIE QI RU
AZUMA YUKI
KOBAYASHI HIDEYUKI
YOSHIKOSHI DAISUKE
FUNAKUBO TAKAO
IWASAKI MINEHISA
XIE QI RU
AZUMA YUKI
KOBAYASHI HIDEYUKI
Application Number:
JP2018141369A
Publication Date:
January 30, 2020
Filing Date:
July 27, 2018
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/3065; C23C16/44; C23C16/455; C23C16/50; H01L21/31; H01L21/316
Domestic Patent References:
| JP2008135739A | 2008-06-12 | |||
| JP2017212447A | 2017-11-30 | |||
| JP2004342703A | 2004-12-02 | |||
| JP2008509573A | 2008-03-27 | |||
| JP2007531987A | 2007-11-08 | |||
| JPH1070109A | 1998-03-10 | |||
| JP2016063083A | 2016-04-25 | |||
| JP2012518267A | 2012-08-09 | |||
| JP2009503876A | 2009-01-29 | |||
| JP2013089972A | 2013-05-13 |
Foreign References:
| US20120095586A1 | 2012-04-19 |
Attorney, Agent or Firm:
Tetsuo Kanamoto
Koji Hagiwara
Naoki Ogita
Koji Hagiwara
Naoki Ogita