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Title:
WAFER PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2020136405
Kind Code:
A
Abstract:
To form a device chip without deteriorating quality.SOLUTION: A wafer processing method for dividing a wafer in which a plurality of devices are formed in each region on a surface partitioned by division schedule lines into individual device chips comprises a polyester-based sheet arranging step, an integrating step, a dividing step, and a picking-up step. The polyester-based sheet arranging step positions the wafer in an opening of a frame and arranges a polyester-based sheet in a rear surface of the wafer and an outer periphery of the frame, the opening housing the wafer. The integrating step heats and presses the polyester-based sheet, and integrates the wafer and the frame via the polyester-based sheet. The dividing step forms a division groove by irradiating the wafer with a laser beam of a wavelength having absorbability to the wafer along the division schedule lines and divides the wafer into individual device chips. The picking-up step applies ultrasonic waves to the polyester-based sheet, pushes up the device chip, and picks up the device chip from the polyester-based sheet.SELECTED DRAWING: Figure 4

Inventors:
HARADA SHIGENORI
MATSUZAWA MINORU
KIUCHI ITSUTO
YODO YOSHIAKI
ARAKAWA TARO
UENO MASAMITSU
KAWAMURA SUMIKO
FUJII YUSUKE
MIYAI TOSHITERU
OMAE MAKIKO
Application Number:
JP2019025971A
Publication Date:
August 31, 2020
Filing Date:
February 15, 2019
Export Citation:
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Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
H01L21/301; B23K26/364; H01L21/683
Attorney, Agent or Firm:
Akira Matsumoto
Tomohiro Okamoto
Kasahara Takahiro
Ei Okamoto
Takayuki Okano