Title:
METHOD FOR FILTERING ADDITIVE AGENT-CONTAINING LIQUID FOR POLISHING, ADDITIVE AGENT-CONTAINING LIQUID FOR POLISHING, POLISHING COMPOSITION AND MANUFACTURING METHOD THEREOF, AND FILTER
Document Type and Number:
Japanese Patent JP2021027300
Kind Code:
A
Abstract:
To provide a method for filtering an additive agent-containing liquid, which can realize a polishing composition showing a superior defect-decreasing power while retaining a practical filter life.SOLUTION: A method for filtering an additive agent-containing liquid for polishing is provided according to the present invention. The step comprises the step of filtering the additive agent-containing liquid for polishing by a filter which satisfies the requirements (1) and (2) below. (1)The average pore size P measured by a perm porometer is 0.15 μm or less. (2)The pore size gradient (Sin/Sout) which is a ratio of an entry side average pore size Sin and an outlet side average pore size Sout, measured by SEM observation is 3 or less.SELECTED DRAWING: None
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Inventors:
FURUTA SHINJI
HAYAKAWA TAKASHI
ASHITAKA KEIJI
MIWA NAOYA
TSUCHIYA KOSUKE
TANSHO HISANORI
AKIZUKI REIKO
HAYAKAWA TAKASHI
ASHITAKA KEIJI
MIWA NAOYA
TSUCHIYA KOSUKE
TANSHO HISANORI
AKIZUKI REIKO
Application Number:
JP2019146778A
Publication Date:
February 22, 2021
Filing Date:
August 08, 2019
Export Citation:
Assignee:
FUJIMI INC
International Classes:
H01L21/304; B24B37/00; B24B57/02; C09G1/02
Domestic Patent References:
| JP2016089297A | 2016-05-23 | |||
| JP2014173013A | 2014-09-22 | |||
| JP2012044056A | 2012-03-01 | |||
| JP2015045114A | 2015-03-12 |
Foreign References:
| WO2011108418A1 | 2011-09-09 |
Attorney, Agent or Firm:
Makoto Abe
Michiko Oi
Seiji Tani
Megumi Umehara
Michiko Oi
Seiji Tani
Megumi Umehara