Title:
PATTERN HEIGHT INFORMATION CORRECTING SYSTEM AND PATTERN HEIGHT INFORMATION CORRECTING METHOD
Document Type and Number:
Japanese Patent JP2021043096
Kind Code:
A
Abstract:
To provide a pattern height information correcting system and a pattern height information correcting method for acquiring sample height information from an atomic force microscope image, the information where local deviations due to an atmospheric pressure change and/or disturbance such as vibration are removed.SOLUTION: The pattern height information correcting system comprises: a design information database 111 for storing the contour line information of patterns extracted from an acquired image that includes an AFM module 103 and design information that includes layer information; and computer systems 108, 109 for dividing, into areas, the pattern extracted on the basis of design information relating to the extracted pattern and stored in the design information database 111, and correlating the divided areas to the layer information. The computer systems specify a horizontal area from the divided areas that is previously designated as being horizontal, create an approximate curve on the basis of the specified horizontal area that corresponds to the same layer information, and correct the pattern height information extracted using the approximate curve.SELECTED DRAWING: Figure 1
Inventors:
YAMASAKI KENJI
SHINDO HIROYUKI
KASHIWA TAEKO
KAGETANI RYUGO
SHINDO HIROYUKI
KASHIWA TAEKO
KAGETANI RYUGO
Application Number:
JP2019166105A
Publication Date:
March 18, 2021
Filing Date:
September 12, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
G01Q30/06; G01Q60/24
Domestic Patent References:
| JPH06147821A | 1994-05-27 | |||
| JPH04215005A | 1992-08-05 | |||
| JPH11142416A | 1999-05-28 | |||
| JP2019035741A | 2019-03-07 | |||
| JP2011043458A | 2011-03-03 |
Foreign References:
| US20150160259A1 | 2015-06-11 |
Other References:
HAL EDWARDS: "Vertical metrology using scanning-probe microscopes : Imaging distortions and measurement repeatabil", JOURNAL OF APPLIED PHYSICS, vol. 83, no. 8, JPN6022055081, 15 April 1998 (1998-04-15), pages 3952 - 3971, XP012044981, ISSN: 0004953483, DOI: 10.1063/1.367151
Attorney, Agent or Firm:
Polaire Patent Business Corporation