Title:
GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND CONTROL METHOD FOR GAS SUPPLY SYSTEM
Document Type and Number:
Japanese Patent JP2021082127
Kind Code:
A
Abstract:
To provide a gas supply system, a plasma processing apparatus and a control method for the gas supply system, capable of distributing gas with high response.SOLUTION: A gas supply system, connected between chambers with a first gas inlet and a second gas inlet and a gas source, includes a plurality of flow rate control lines. Each of the flow rate control lines includes a pair of a first line and a second line. The first line connects the gas source and the first gas inlet and has a first valve and a first orifice. The second line connects the gas source and the second gas inlet and has a second valve and a second orifice. the first orifice and the second orifice in each flow rate control line include a flow rate control unit with the same size and a control section configured to control opening and closing of the first valve and the second valve in each flow rate control line.SELECTED DRAWING: Figure 2
Inventors:
JUNG HWAJUN
KITAMURA YUJI
KITAMURA YUJI
Application Number:
JP2019210537A
Publication Date:
May 27, 2021
Filing Date:
November 21, 2019
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
G05D7/06; C23C16/455; C23C16/52; G05D11/13; H01L21/3065
Domestic Patent References:
| JP2009523321A | 2009-06-18 | |||
| JP2014098954A | 2014-05-29 | |||
| JP2014042041A | 2014-03-06 | |||
| JPH0314151U | 1991-02-13 |
Foreign References:
| US20140261805A1 | 2014-09-18 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito