Title:
ETCHING PROCESS LIQUID
Document Type and Number:
Japanese Patent JP2021143422
Kind Code:
A
Abstract:
To provide a technique that improves water repellency of aluminum material.SOLUTION: An etching process liquid for improving the water repellency of aluminum material contains alkali and zinc ion sources.SELECTED DRAWING: None
Inventors:
TSUJIMOTO TAKAMITSU
HIRAI KENTARO
HARA KENJI
TANAKA KATSUYUKI
MORIGUCHI TOMO
YASUHARA SHIYUMA
HIRAI KENTARO
HARA KENJI
TANAKA KATSUYUKI
MORIGUCHI TOMO
YASUHARA SHIYUMA
Application Number:
JP2021034430A
Publication Date:
September 24, 2021
Filing Date:
March 04, 2021
Export Citation:
Assignee:
OKUNO CHEM IND CO
NARA INSTITUTE OF SCHIENCE AND TECH
NARA INSTITUTE OF SCHIENCE AND TECH
International Classes:
C23F1/36; C23F1/00
Attorney, Agent or Firm:
Patent Business Corporation Saegusa International Patent Office