Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023160797
Kind Code:
A
Abstract:
To provide a carboxylate and the like which allow a resist pattern having a good mask error factor to be produced, and a resist composition containing the same.SOLUTION: There are provided: a carboxylate represented by formula (I) and the like; and a resist composition containing the same. [In the formula, Ar1-Ar3 each represent naphthalene, anthracene or phenanthrene; R1-R3 each represent -O-R10, -O-CO-O-R10 or the like; R10 represents an acid-labile group; R4-R9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1-A3 each represent a hydrocarbon group; and X0 represents an optionally substituted hydrocarbon group.]SELECTED DRAWING: None
Inventors:
HOMMA HARUKA
YASUE RISA
ICHIKAWA KOJI
YASUE RISA
ICHIKAWA KOJI
Application Number:
JP2023069301A
Publication Date:
November 02, 2023
Filing Date:
April 20, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07D321/10; C08F20/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP