Title:
【発明の名称】被検査パターンの欠陥検査方法
Document Type and Number:
Japanese Patent JP2602201
Kind Code:
B2
Abstract:
Two kinds of image corresponding to a reference pattern and a pattern to be inspected are converted into binary images and local images cut out from the binary images are compared with each other to detect differences between the cut out images and recognize these differences as a defect. One of the main subjects of the inspecting method is to moderate excess sensitivity to the different portions to the extent of allowing non-serious actual defects. By setting don't care areas each of which consists of one pixel row neighboring on a binary boundary line in the image, and comparing the remaining portions of the images other than the don't care areas by logical processing it is possible to detect various defects without regarding the quantization error as a defect.
Inventors:
Toshimitsu Hamada
Nomoto Mineo
Kozo Nakahata
Nomoto Mineo
Kozo Nakahata
Application Number:
JP7638985A
Publication Date:
April 23, 1997
Filing Date:
April 12, 1985
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
H04N7/18; G06T7/00; H01L51/00; G01N21/956; (IPC1-7): H04N7/18
Domestic Patent References:
| JP59119467A | ||||
| JP54143168A |
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)