【発明の名称】真空ロードロツクを具えたプラズマ反応装置

Title:

【発明の名称】真空ロードロツクを具えたプラズマ反応装置

Document Type and Number:

Japanese Patent JP2635099

Kind Code:

B2

Abstract:

A compact load lock and processing chamber is disclosed in which a moveable member forms a closure for both a load lock volume and an article processing volume. The moveable member is connected to fixed members by a flexible diaphragm which provides a non-sliding seal.

More Like This:

JP2001244214	METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT PROVIDED WITH SILICIDE FILM
JP2611489	INDUSTRIAL APPLICABILITY: A high-frequency discharge utilization device and a method for manufacturing a semiconductor using the device.
JPH01222436	MANUFACTURE OF SEMICONDUCTOR DEVICE

Inventors:

BURAIAN ETSUCHI SHEKAAJAN
JEI BII PUROSESU

Application Number:

JP11674688A

Publication Date:

July 30, 1997

Filing Date:

May 13, 1988

Export Citation:

Click for automatic bibliography generation Help

Assignee:

BARUTSUERUSU AG

International Classes:

H01L21/302; H01J37/18; H01L21/205; H01L21/3065; H01L21/31; H01L21/67; H01L21/677; (IPC1-7): H01L21/3065; H01L21/205

Domestic Patent References:

JP61210634A

Attorney, Agent or Firm:

Kyozo Yuasa (6 people outside)

Previous Patent: 硬化性ポリオルガノシロキサン組成物

Next Patent: バケット往復搬送システム