Title:
【発明の名称】ポジ型フオトレジスト組成物
Document Type and Number:
Japanese Patent JP2711590
Kind Code:
B2
Abstract:
A positive-type photoresist composition is described as including: (1) an alkali-soluble phenol novolak having a degree of dispersion of from 1.5 to 4.0; (2) a 1,2-quinone diazide compound; and (3) from 2 to 30% by weight, based on the above-mentioned novolak, of a low molecular weight compound having a total of from 12 to 50 carbon atoms per molecule and 2 to 8 phenolic hydroxyl groups per molecule. The degree of dispersion is determined from a weight-average molecular weight of the novolak and a number-average molecular weight of the novolak, both the weight-average and number-average molecular weights being obtained by gel permeation chromatography (GPC) defined by using standard polystyrene as a reference, such that the degree of dispersion is a ratio of the weight-average molecular weight to the number average molecular weight. The positive-type photoresist composition of the present invention is excellent in development latitude and has a high sensitivity and a high resolving power. Thus, it is suitable for use in, for example, the production of semiconductors such as integrated circuits, the production of circuit substrates for thermal heads, and photofabrication processes.
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Inventors:
Shinji Sakaguchi
Tadayoshi Kokubo
Shiro Tan
Tadayoshi Kokubo
Shiro Tan
Application Number:
JP24297390A
Publication Date:
February 10, 1998
Filing Date:
September 13, 1990
Export Citation:
Assignee:
Fuji Photo Film Co., Ltd.
International Classes:
G03F7/004; G03F7/022; G03F7/023; H01L21/027; H01L21/30; (IPC1-7): G03F7/004; G03F7/022; H01L21/027
Domestic Patent References:
| JP61205933A | ||||
| JP6343134A | ||||
| JP6045238A | ||||
| JP22560A | ||||
| JP1289946A | ||||
| JP1154049A |
Attorney, Agent or Firm:
Yoichi Ishii (1 person outside)