Title:
【発明の名称】超電導配線の製造方法
Document Type and Number:
Japanese Patent JP2790459
Kind Code:
B2
Abstract:
PURPOSE:To facilitate the manufacture of submicron rule wiring by a method wherein a resist wiring pattern is formed on an oxide superconducting thin film, inert gas ions are projected on the entire surface for a partial removal of the oxide superconducting thin film, and then the entirety is subjected to a heat treatment in an oxygen atmosphere at a temperature not higher than the crystallization temperature. CONSTITUTION:A resist 3 is applied to the surface of an oxide superconducting thin film 2 in presence on a substrate 1, which is followed by a conventional photoprocess wherein a resist 13 is so patterned as to cover a part to be retained as a wire. A process follows wherein inert gas ions 4 are projected upon the oxide superocnducting thin film 2 for the removal by etching of a part 4 not covered by the resist 13. The resist 13 is removed from the substrate 1 after the ion etching process, the substrate 1 is then heated in an oxygen atmosphere at a temperature not higher than the crystallization temperature of an oxide superconducting thin film wiring 12, which results in an oxide superconducting thin film wiring 22. This design facilitates the manufacture of submicron rule wiring.
More Like This:
Inventors:
TONO HIDETAKA
ENOHARA AKIRA
MIZUNO KOICHI
MITSUYU TSUNEO
SETSUNE KENTARO
WASA KYOTAKA
ENOHARA AKIRA
MIZUNO KOICHI
MITSUYU TSUNEO
SETSUNE KENTARO
WASA KYOTAKA
Application Number:
JP6399988A
Publication Date:
August 27, 1998
Filing Date:
March 17, 1988
Export Citation:
Assignee:
MATSUSHITA DENKI SANGYO KK
International Classes:
H01L39/24; C01G1/00; C04B41/87; C23F4/00; H01B12/06; H01B13/00; H01L21/3205; H01L23/52; (IPC1-7): H01L39/24; C04B41/87; C23F4/00; H01B13/00; H01L21/3205
Domestic Patent References:
| JP1102976A |
Other References:
固体物理 Ｖｏｌ．２３ Ｎｏ．２ （１９８８） ＰＰ．１２５−１３１
第４８回応用物理学会学術講演会講演予稿集 （昭６２−１０−１７〜２０） １９ｐ−Ｄ−２
第４８回応用物理学会学術講演会講演予稿集 （昭６２−１０−１７〜２０） １９ｐ−Ｄ−２
Attorney, Agent or Firm:
Tomoyuki Takimoto