Title:
【発明の名称】イオンビーム装置及びその制御方法
Document Type and Number:
Japanese Patent JP2834466
Kind Code:
B2
Abstract:
PURPOSE:To execute stable ion beam machining with high accuracy by applying a DC voltage to an electrode into which an ion beam flows in such a manner that the electrode side is anode and suppressing the generated secondary electrons, then measuring only the ion beam current flowing into the electrode. CONSTITUTION:The DC voltage is applied to the electrode 4 into which either of a part or the whole of the ion beam 10 flows in such a manner that the electrode 4 side is the anode. The secondary electrons generated from the electrode 4 are suppressed and only the ion beam current corresponding to the processing depth flowing into the electrode 4 is measured. The calculation error of the current by the secondary electrons 40 and the current of the ion beam 10 and the waste of the machining time are, therefore, eliminated and only the defective part of the ion beam 10 can be removed. Damaging of the normal parts is thus obviated. The stable ion beam machining is executed with the high accuracy in this way.
Inventors:
SAITO KEIYA
YAMAGUCHI HIROSHI
YAMAGUCHI HIROSHI
Application Number:
JP276289A
Publication Date:
December 09, 1998
Filing Date:
January 11, 1989
Export Citation:
Assignee:
HITACHI SEISAKUSHO KK
International Classes:
B23K15/00; G03F1/72; G03F1/74; H01J37/30; H01J37/305; H01L21/027; H01L21/30; H01L21/302; (IPC1-7): H01J37/305; H01J37/30
Domestic Patent References:
| JP62117248A | ||||
| JP62219449A | ||||
| JP60101849A | ||||
| JP59128161U |
Attorney, Agent or Firm:
Masami Akimoto