Title:
【発明の名称】プラズマ装置、薄膜形成方法及びエッチング方法
Document Type and Number:
Japanese Patent JP2996162
Kind Code:
B2
Inventors:
Yuna Manabe
Application Number:
JP33647495A
Publication Date:
December 27, 1999
Filing Date:
December 25, 1995
Export Citation:
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
H05H1/46; C23C16/50; C23C16/511; C23F4/00; H01L21/205; H01L21/285; H01L21/302; H01L21/3065; (IPC1-7): H01L21/3065; C23C16/50; C23F4/00; H01L21/205; H01L21/285; H05H1/46
Domestic Patent References:
| JP7235393A | ||||
| JP258832A | ||||
| JP258829A | ||||
| JP6324623A |
Attorney, Agent or Firm:
Fumio Iwahashi (2 others)