【発明の名称】パタ―ン形成材料及びパタ―ン形成方法 - Semiconductor Leading Edge Technologies, Inc.

Title:

【発明の名称】パタ―ン形成材料及びパタ―ン形成方法

Document Type and Number:

Japanese Patent JP3015019

Kind Code:

B1

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Inventors:

Masataka Endo
Masamitsu Shirai
Masahiro Kadooka

Application Number:

JP2480199A

Publication Date:

February 28, 2000

Filing Date:

February 02, 1999

Export Citation:

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Assignee:

Semiconductor Leading Edge Technologies, Inc.

International Classes:

H01L21/027; C08F212/14; C08F220/34; G03F7/004; G03F7/36; G03F7/38; (IPC1-7): G03F7/004; C08F212/14; C08F220/34; G03F7/36; G03F7/38; H01L21/027

Domestic Patent References:

JP422957A
JP7261393A
JP11258803A

Attorney, Agent or Firm:

Shoji Mizoi (2 outside)

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