Title:
F2ガス発生装置及びF2ガス発生方法並びにF2ガス
Document Type and Number:
Japanese Patent JP3569279
Kind Code:
B2
Abstract:
An F2 gas generating apparatus for generating a high purity F2 gas by subjecting an electrolytic bath made of KF.2HF to electrolysis is characterized by comprising a preparing system for preparing KF.2HF from KF or KF.HF, an HF supplying system for supplying HF into the electrolytic bath and the preparing system, and an F2 gas generating system for generating the F2 gas by subjecting KF.2HF prepared by the preparing system to electrolysis.
More Like This:
| WO/2008/000029 | IMPROVED WATER TREATMENT METHOD |
| JP5431223 | Gas generator |
Inventors:
Tetsuro Tojo
Jiro Hiraiwa
Hitoshi Takebayashi
Yoshiomi Tada
Jiro Hiraiwa
Hitoshi Takebayashi
Yoshiomi Tada
Application Number:
JP2003553033A
Publication Date:
September 22, 2004
Filing Date:
December 09, 2002
Export Citation:
Assignee:
Toyo Tanso Co., Ltd.
International Classes:
C25B1/24; C25B15/00; (IPC1-7): C25B1/24; C25B15/02; C25B15/08
Domestic Patent References:
| JP2000313981A | ||||
| JP58067877A |
Foreign References:
| WO2001077412A1 |
Attorney, Agent or Firm:
Yoshiyuki Kaji
Makoto Suhara
Makoto Suhara