Title:
集束荷電粒子ビーム加工方法およびその装置
Document Type and Number:
Japanese Patent JP3578867
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a device, which can perform the scanning without generat ing a part left as it is not scanned, by providing a digital code generator, a D/A convertor, and a means for adding a specified fine offset value to the signal to be applied to a deflecting electrode. SOLUTION: A scanning signal generator 11 generates the focused ion beam scanning signal for scanning an irradiation spot of the focused ion beam and the image scanning signal for scanning the electron beam 7 of an image display 7. The focused ion beam scanning signal generated from a scanning signal generator 11 and the image scanning signal are the same digital signal. A fine offset signal generator 12 generates the fine offset signal as the digital signal so that irradiation of the focused ion beam 10 is displaced by a fine quantity for scanning on the basis of the signal by the only scanning signal generator 11. The scanning signal generator 11 and the fine offset signal generator 12 are controlled by a control computer 19 so as to set the scanning area and the offset variable of the beam 10.
Inventors:
Yasuhiko Sugiyama
Application Number:
JP11674796A
Publication Date:
October 20, 2004
Filing Date:
May 10, 1996
Export Citation:
Assignee:
SII Nanotechnology Co., Ltd.
International Classes:
H01J37/147; H01J37/302; (IPC1-7): H01J37/302; H01J37/147
Domestic Patent References:
| JP8094644A | ||||
| JP6180208A | ||||
| JP1293538A | ||||
| JP9245720A | ||||
| JP3048499B2 |
Attorney, Agent or Firm:
Yoshiharu Matsushita