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Title:
薄膜圧電抵抗センサ製作の方法
Document Type and Number:
Japanese Patent JP3730868
Kind Code:
B2
Abstract:
Semiconductor piezoresistive sensors are formed by a process using selective laser activation of a doped semiconductor surface. The substrate is a flexible membrane such as a diaphragm or bellows. A layer of insulative dielectric material is first applied to the substrate. A layer of highly resistive doped semiconductor material is then deposited on top of the dielectric layer. Through the use of an alignment device one or more piezoresistive sensors are formed by use of laser annealing of selected areas of the semiconductor material such that the annealed areas have a resistance suitable for use as sensors. Metal contacts are then applied over the end portions of sensors and form an electrical connection to the sensors. The non-annealed portions of doped semiconductor layer act as insulators between the formed piezoresistive sensors.

Inventors:
Robert Merchant
Majid Fazeri
Application Number:
JP2000611045A
Publication Date:
January 05, 2006
Filing Date:
April 13, 2000
Export Citation:
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Assignee:
Microlith Corporation
International Classes:
G01L1/18; G01L1/22; G01L9/00; G01L9/04; H01L41/08
Domestic Patent References:
JP4303774A
JP5142076A
JP5206482A
JP63076484A
Attorney, Agent or Firm:
Motohiro Kurauchi