Title:
絶縁膜形成用組成物
Document Type and Number:
Japanese Patent JP4044759
Kind Code:
B2
Abstract:
To provide an insulating coating composition which can obtain a low dielectric constant film at a low curing temperature in a short period of time.
The insulating composition comprises at least one silane compound to be selected from alkoxysilanes, their hydrolyzates, and their condensates, an organic polymer and a nonionic surface active agent. A hydrophilic group contained in the nonionic surface active agent has a structure of formula (1): -CO-NR
COPYRIGHT: (C)2003,JPO
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Inventors:
Toru Araki
Mikihiko Nakamura
Mikihiko Nakamura
Application Number:
JP2001385912A
Publication Date:
February 06, 2008
Filing Date:
December 19, 2001
Export Citation:
Assignee:
ASAHI KASEI KABUSHIKI KAISHA
International Classes:
C09D183/04; C09D5/25; C09D7/12; C09D201/00; H01L21/312; H01L21/316
Domestic Patent References:
| JP2002220224A | ||||
| JP2002026003A | ||||
| JP2000299317A | ||||
| JP2001181570A | ||||
| JP9183948A | ||||
| JP2001287909A |
Foreign References:
| WO2001074957A1 | ||||
| WO2000018847A1 |