Title:
検査装置および記録媒体
Document Type and Number:
Japanese Patent JP4086373
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To excel the limit of inspection of a hole which is caused by a secondary electron image and a reflected electron image, and realize the quantitative measurement of a fine hole, by detecting an X-ray radiated when a substrate to be inspected is irradiated with an electron beam. SOLUTION: A substrate to be inspected in which one or a plurality of apertures are formed on an A layer 41 is scanned and irradiated with electron beams 45, 45'. Radiated X-rays are detected with an X-ray detector. On the basis of the detected signal, X-ray spectrum is calculated. The ratio of X-ray spectrum radiated from the A layer 41 to X-ray spectrum radiated from a B layer 42 is obtained. Thereby the area or the diameter of the aperture part formed in the A layer is calculated. In the spectrum of characteristic X-ray 46 when the A layer 41 is irradiated with the electron beam 45, peaks exist at, e.g. energy S1, S3, S4. In the spectrum of characteristic X-ray when the B layer 42 is irradiated with the electron beam 45', peaks exist at, e.g. energy S1, S2.
Inventors:
Anazawa
Nakamura Naoyuki
Nakamura Naoyuki
Application Number:
JP24573798A
Publication Date:
May 14, 2008
Filing Date:
August 31, 1998
Export Citation:
Assignee:
Holon Co., Ltd.
International Classes:
G01B15/00; H01J37/28
Domestic Patent References:
| JP2189409A | ||||
| JP3020606A | ||||
| JP61099808A |
Attorney, Agent or Firm:
Morihiro Okada