Title:
光酸発生剤単量体の組成物、該組成物でコーティングされた基板、該組成物を利用して基板上に化合物を合成する方法及び該方法によって製造されたマイクロアレイ
Document Type and Number:
Japanese Patent JP4095980
Kind Code:
B2
Abstract:
A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a solid substrate; coating a layer of the photoacid generator monomer composition according to the present invention on the layer of first molecules; exposing the composition layer to light and then heat-treating to remove the acid labile protecting group from the first molecules corresponding to the exposed portion; washing and removing the composition layer from the exposed and unexposed portions; and bonding second molecules to the exposed first molecules.
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Inventors:
Cheng Sheng Asahi
Xu
Park
Xu
Park
Application Number:
JP2004245932A
Publication Date:
June 04, 2008
Filing Date:
August 25, 2004
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
G01N33/53; B01J19/00; C09D5/00; C09D7/12; C09D157/08; C12M1/00; C12N15/09; C12Q1/68; G01N33/545; G01N33/552; G01N37/00; G03C5/00; G03F7/004; G03F7/029; G03F7/26; G03F7/40; G03F7/42; H01L21/027; C40B40/06; C40B40/10; C40B50/14; C40B60/14
Domestic Patent References:
| JP2003501640A | ||||
| JP2002502698A |
Foreign References:
| WO2003058347A1 |
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii