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Title:
半導体装置の成膜方法
Document Type and Number:
Japanese Patent JP4099462
Kind Code:
B2
Inventors:
Masahiro Hiketa
Yasuhiro Uemoto
Application Number:
JP2004156736A
Publication Date:
June 11, 2008
Filing Date:
May 26, 2004
Export Citation:
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Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
C23C16/42; H01L21/316; H01L21/822; H01L27/04
Domestic Patent References:
JP3166372A
JP5259155A
JP8008336A
JP8306685A
JP3198340A
Attorney, Agent or Firm:
Hiromori Arai



 
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