Title:
マスクパターン評価システム及びその方法
Document Type and Number:
Japanese Patent JP4104840
Kind Code:
B2
Abstract:
An aspect of the present invention provides a system for evaluating mask patterns, including a pattern image generator configured to generate a pattern image of mask patterns to be formed on a mask, a defect generator configured to receive defect data for particles and imaginarily generate defects on the mask according to the defect data, a pattern-defect image generator configured to generate a pattern-defect image of the mask by combining the generated pattern image with the generated defects, a pattern tester configured to determine whether or not each of the defects in the pattern-defect image is allowable according to pattern rules, and a ratio computation unit configured to compute at least one of an allowable ratio and an un allowable ratio according to a determination result from the pattern tester.
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Inventors:
Toshinobu Noda
Application Number:
JP2001253110A
Publication Date:
June 18, 2008
Filing Date:
August 23, 2001
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F1/84
Domestic Patent References:
| JP10293393A | ||||
| JP2000068341A |
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Kawamata Sumio
Nakamura Tomoyuki
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu
Iwa Saki Kokuni
Kawamata Sumio
Nakamura Tomoyuki
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu