Title:
ステンシルマスクの寿命を延長するための装置
Document Type and Number:
Japanese Patent JP4175929
Kind Code:
B2
Abstract:
An apparatus for masked ion-beam lithography comprises a mask maintenance module for prolongation of the lifetime of the stencil mask. The module comprises a deposition means for depositing material to the side of the mask irradiated by the lithography beam, with at least one deposition source being positioned in front of the mask, and further comprises a sputter means in which at least one sputter source, positioned in front of the mask holder means and outside the path of the lithography beam, produces a sputter ion beam directed to the mask in order to sputter off material from said mask in a scanning procedure and compensate for inhomogeneity of deposition.
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Inventors:
Elmer Platz Guma
Hans Loechner
Gerhard Stengle
Hans Loechner
Gerhard Stengle
Application Number:
JP2003079707A
Publication Date:
November 05, 2008
Filing Date:
March 24, 2003
Export Citation:
Assignee:
IMS Nano Fabric Fabric Zion AG
International Classes:
H01L21/027; C23C14/04; C23C14/32; C23C14/34; C23C14/46; C23C14/54; G03F1/00; H01J37/317
Domestic Patent References:
| JP2002246296A | ||||
| JP10144249A | ||||
| JP5241328A | ||||
| JP5175112A | ||||
| JP2003133203A | ||||
| JP2002141266A | ||||
| JP2000232047A | ||||
| JP2000122267A |
Attorney, Agent or Firm:
Minoru Yoshida
Tatsuya Tanaka
Nobuyuki Matsubara
Kiyoji Muraki
Hashimoto Chikako
Sayaka Matsushima
High Iku child
Masami Ishida
Tatsuya Tanaka
Nobuyuki Matsubara
Kiyoji Muraki
Hashimoto Chikako
Sayaka Matsushima
High Iku child
Masami Ishida