Title:
ポジ型レジスト組成物
Document Type and Number:
Japanese Patent JP4177952
Kind Code:
B2
Abstract:
A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
Inventors:
Kunihiko Kodama
Shinichi Kanna
Shinichi Kanna
Application Number:
JP2000150217A
Publication Date:
November 05, 2008
Filing Date:
May 22, 2000
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C07C25/18; C07C381/12; C07D275/06; C08K5/13; C08K5/16; C08K5/43; C08L25/02; C08L25/16; C08L101/00; G03F7/039; H01L21/027
Domestic Patent References:
| JP9258435A | ||||
| JP11327149A | ||||
| JP10142777A |
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa
Kiyozumi Yazawa