Title:
光投射装置
Document Type and Number:
Japanese Patent JP4215713
Kind Code:
B2
Abstract:
An apparatus for immersion optical lithography having a lens capable of relative movement in synchrony with a horizontal motion of a semiconductor wafer in a liquid environment where the synchronous motion of the lens apparatus and semiconductor wafer advantageously reduces the turbulence and air bubbles associated with a liquid environment. The relative motions of the lens and semiconductor wafer are substantially the same as the scanning process occurs resulting in optimal image resolution with minimal air bubbles, turbulence, and disruption of the liquid environment.
Inventors:
Mark Charles Hakey
David Vaklav Horak
Charles William Koberger iii
Peter H. Mitchell
David Vaklav Horak
Charles William Koberger iii
Peter H. Mitchell
Application Number:
JP2004372593A
Publication Date:
January 28, 2009
Filing Date:
December 24, 2004
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2002083766A | ||||
| JP10255319A | ||||
| JP7220990A | ||||
| JP6124873A |
Foreign References:
| WO2004107048A1 | ||||
| WO2005006416A1 |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Takeshi Ueno
Yoshihiro City
Takeshi Ueno