Title:
温度制御方法及び装置、並びに露光方法及び装置
Document Type and Number:
Japanese Patent JP4273421
Kind Code:
B2
Abstract:
A technique of controlling temperature with high precision even if a device thermally variable by the state of a temperature-controlled fluid is used, and an exposure technique are disclosed. The gas collected from a reticle chamber (32) the temperature of which is controlled and a high-purity purging gas from a gas supply source (35) are mixed in a mixing unit (45). The mixed gas is cooled by a refrigerating machine (47), and the humidity is measured by a humidity sensor (49). After the measurement, the gas is supplied to the reticle chamber (32) through a heater (52), a chemical filter (53) absorbing/generating heat depending on humidity, and a dust-removal filter (54). The amount of heat added to the gas by the heater (52) is controlled according to information on temperature given by a temperature sensor (39B) in the reticle chamber (32) and information on humidity given by the humidity sensor (49).
Inventors:
Dai Arai
Tomoyuki Yoshida
Tomoyuki Yoshida
Application Number:
JP2004532707A
Publication Date:
June 03, 2009
Filing Date:
August 26, 2003
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; F24F3/14; F24F3/16; G03F7/20; G05D23/00
Domestic Patent References:
| JP2002158170A | ||||
| JP2002153719A | ||||
| JP200281691A | ||||
| JP2001153414A | ||||
| JP10149970A | ||||
| JP1054585A |
Attorney, Agent or Firm:
Satoshi Omori