Title:
SOIウエーハの製造方法
Document Type and Number:
Japanese Patent JP4398934
Kind Code:
B2
More Like This:
| JP2002083880 | SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREFOR |
| JPH0611342 | [Name of invention] Semiconductor substrate |
| JP2011023589 | SYSTEM FOR TREATING SUBSTRATE |
Inventors:
Tokio Takei
Shigeyuki Yoshizawa
Shin Miyazaki
Isao Yokokawa
Nobuhiko Noto
Shigeyuki Yoshizawa
Shin Miyazaki
Isao Yokokawa
Nobuhiko Noto
Application Number:
JP2005304884A
Publication Date:
January 13, 2010
Filing Date:
October 19, 2005
Export Citation:
Assignee:
Shin-Etsu Semiconductor Co., Ltd.
Nagano Electronics Co., Ltd.
Nagano Electronics Co., Ltd.
International Classes:
H01L21/02; H01L27/12
Domestic Patent References:
| JP2004022838A | ||||
| JP9017984A | ||||
| JP2185032A | ||||
| JP2000124092A | ||||
| JP2000030995A | ||||
| JP2000031071A | ||||
| JP2004356416A | ||||
| JP2002170808A | ||||
| JP2004079908A | ||||
| JP11354760A |
Attorney, Agent or Firm:
Mikio Yoshimiya