Title:
レジスト材料及びこれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4435196
Kind Code:
B2
Abstract:
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
Inventors:
Tomohiro Kobayashi
Jun Hatakeyama
Yuji Harada
Jun Hatakeyama
Yuji Harada
Application Number:
JP2007086625A
Publication Date:
March 17, 2010
Filing Date:
March 29, 2007
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039
Domestic Patent References:
| JP2008107443A | ||||
| JP2007065024A | ||||
| JP2006048029A | ||||
| JP2004029088A | ||||
| JP2002122994A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa