Title:
金属酸化物膜の成膜装置及び成膜方法
Document Type and Number:
Japanese Patent JP4453588
Kind Code:
B2
Abstract:
To obtain a metal oxide film for a photocatalyst having excellent uniformity, high performance and stable quality.
Film deposition is performed using an air opening type CVD system in which a gaseous starting material feed nozzle is installed so as to be tilted at an angle of 25 to 50 degrees to the normal of the surface of a base material. Humidified air is fed to the vicinity of the base material, and moisture required for reaction is fed. It is preferable that the vicinity of the base material is air-sealed with dry air as well. As a metal oxide film, a composite metal oxide film composed of TiO
COPYRIGHT: (C)2006,JPO&NCIPI
Inventors:
Kengo Okamoto
Yuji Shimizu
Kazuki Mizushima
Senbokuya Kazuaki
Yuji Shimizu
Kazuki Mizushima
Senbokuya Kazuaki
Application Number:
JP2005085784A
Publication Date:
April 21, 2010
Filing Date:
March 24, 2005
Export Citation:
Assignee:
Mitsubishi Materials Corporation
International Classes:
C23C16/40; B01J35/02; C23C16/455
Domestic Patent References:
| JP63179074A | ||||
| JP2003253451A | ||||
| JP55056039A | ||||
| JP2001064776A |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Masakazu Aoyama
Yasuhiko Murayama
Noriko Yanai
Tadashi Takahashi
Masakazu Aoyama
Yasuhiko Murayama
Noriko Yanai