Title:
基板洗浄装置及び洗浄部材の交換時期判定方法
Document Type and Number:
Japanese Patent JP4511591
Kind Code:
B2
Abstract:
A substrate cleaning apparatus includes a cleaning apparatus 10 including an abutting member which is to be pressed against a cleaning member to clean the cleaning member, a drive control device for controllably driving the abutting member, and a cleaning tank which contains a cleaning liquid and allows a portion of abutment between the cleaning member and the abutting member to be impregnated with the cleaning liquid. The substrate cleaning apparatus also includes an image capturing device which captures a surface image of the cleaning member and an image processing device. A surface condition of the cleaning member is monitored to determine the timing of replacement of the cleaning member. The substrate cleaning apparatus further includes a measurement device which measures the number of particles and/or a concentration of a component in the cleaning liquid in the cleaning tank. Results of measurement by the measurement device are fed back to a drive control device, to thereby prevent contamination of the cleaning member.
Inventors:
Hama Satomi Ta
Application Number:
JP2007505302A
Publication Date:
July 28, 2010
Filing Date:
September 13, 2005
Export Citation:
Assignee:
Ebara Corporation
International Classes:
H01L21/304; B05C11/00; B05C11/10; G02F1/13; G02F1/1333
Domestic Patent References:
| JP2004105848A |
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Akio Chiba
Fujihiro Kanda
Hiroyuki Uchida
Osamu Hoshino
Toru Miyamae
Yamazaki Kosaku
Shinjiro Ono
Akio Chiba
Fujihiro Kanda
Hiroyuki Uchida
Osamu Hoshino
Toru Miyamae
Yamazaki Kosaku