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Title:
薄膜製造装置及び薄膜製造方法
Document Type and Number:
Japanese Patent JP4519695
Kind Code:
B2
Abstract:

To provide a thin film manufacturing apparatus capable of improving the productivity of thin film manufacturing.

The thin film manufacturing apparatus is provided with a first matching unit 13, a first feeding transmission line 12, a discharge electrode 3, and a counter electrode 2. The first matching unit 13 capable of matching the impedance of the output side transmits fed first power. The first feeding transmission line 12 connecting its one end to the first matching unit 13 mediates the feeding of the first power. The discharge electrode 3 is connected to the other end of the first feeding transmission line 12 to receive the first power. The counter electrode 2 is opposed to the discharge electrode 3. The characteristic impedance of the first feeding transmission line 12 is 20 to 30 Ω. The first feeding transmission line 13 is provided with a first heat medium feeding pipe 20 for passing a heat medium, and the discharge electrode 3 is provided with a heat medium circulating pipe 25 for circulating the heat medium. The first matching unit 13 is provided with a first heat medium feeding part 17 for feeding the first heat medium to the first heat medium feeding pipe 20.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
Keisuke Kawamura
Hiro Mashima
Yoshiaki Takeuchi
Kenji Tagashira
Masahiro Sakaki
Application Number:
JP2005096296A
Publication Date:
August 04, 2010
Filing Date:
March 29, 2005
Export Citation:
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Assignee:
MITSUBISHI HEAVY INDUSTRIES,LTD.
International Classes:
H01L21/205; H01L31/04
Domestic Patent References:
JP2000003878A
JP2004153071A
JP2002339073A
Foreign References:
WO2003036680A1
Attorney, Agent or Firm:
Noriharu Fujita
Kunio Ueda
Minoru Kudo
Keisaku Nakao