Title:
タンデム型処理室
Document Type and Number:
Japanese Patent JP4555406
Kind Code:
B2
Abstract:
The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.
Inventors:
Kevin Fairbean
Jessica Vergley
Hari Ponnecanti
W. Nick Taylor
Jessica Vergley
Hari Ponnecanti
W. Nick Taylor
Application Number:
JP31714997A
Publication Date:
September 29, 2010
Filing Date:
November 18, 1997
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/00; H01L21/31; C23C16/44; C23C16/54; H01L21/00; H01L21/205
Domestic Patent References:
| JP5306466A | ||||
| JP786188A | ||||
| JP7183282A | ||||
| JP3230522A |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Ikeda adult
Yuichi Yamada
Ikeda adult