Title:
多数のエポキシ残基を有しており中心部が小さい分子から得られるフォトレジスト底面の反射防止膜
Document Type and Number:
Japanese Patent JP4559228
Kind Code:
B2
Abstract:
Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.
Inventors:
Neil Charles Jay.
Buhave mandal
Fowler Michelle
Windsor michel
Buhave mandal
Fowler Michelle
Windsor michel
Application Number:
JP2004543632A
Publication Date:
October 06, 2010
Filing Date:
October 07, 2003
Export Citation:
Assignee:
Brewer Science INC.
International Classes:
G03F7/11; C07C69/75; C07D251/34; C09B69/00; C09K3/00; G03F7/09; H01L21/027
Domestic Patent References:
| JP11511194A | ||||
| JP2000098595A | ||||
| JP2000294504A | ||||
| JP2001022084A |
Foreign References:
| WO2002086624A1 |
Other References:
化学大辞典編集委員会,化学大事典3,日本,共立出版株式会社,1960年 9月30日,599頁
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Haruko Sanwa