光学的異方性の光誘導生成用の感光材料を形成するフィルム

Japanese Patent JP4570677

B2

This invention relates to a self supporting or substrate-supported film or layer of a photosensitive material comprising a water insoluble complex having one of the following sum formulae (I) to (IV) n R ˆ’ P ˆ’ R €² m ˆ— + m T n ˆ— ˆ’ or m T n ˆ— + n R ˆ’ P ˆ’ R €² m ˆ— ˆ’ n R 1 ˆ’ Q ˆ’ R 1 €² m ˆ— + m T n ˆ— ˆ’ or m T n ˆ— + n R 1 ˆ’ Q ˆ’ R 1 €² m ˆ— ˆ’ wherein [R-P-R'] and [R 1 -Q-R 1' ] , respectively, are photosensitive tectonic units the photosensitive part of which may undergo a photoreaction, selected from photoisomerizations, photocycloadditions and photoinduced rearrangements, and wherein P is a group capable of photoisomerization, Q is a group capable of participating in a photocycloaddition or photoinduced rearrangement reaction, or in a photooxidation reaction, at least one of R and R' is selected from optionally substituted or functionalized aromatic, preferably aryl-containing groups, and at least one of R and R' is positively or negatively charged, with the proviso that if P is -N=N, R and R' both are independently selected from optionally substituted or functionalised aromatic, preferably aryl-containing groups, and if P has a different meaning, the other of R and R' can alternatively be or contain a straight or branched aliphatic group, R 1 and R 1' are independently selected either from optionally substituted or functionalized groups, both or at least one of which being an optionally substituted or functionalized aromatic, preferably aryl-containing group while the other alternatively can be or contain a straight or branched aliphatic group, or from such groups which together with Q form an aromatic system, preferably an aryl ring or heteroaryl ring, with the proviso that either at least one of R 1 and R 1' is positively or negatively charged or the ring structure and/or a substituent thereon will carry at least one positive or negative charge, [T] is an organic, tectonic unit carrying at least one positively or negatively charged group and at least one hydrophobic group, and m. m*, n and n* are preferably selected from or from about 1, 2, 3, 4, 5, 6, 7 or 8, with the proviso that the values of m and m* are identical or do not differ more than 10% from each other and that the values of n and n* are identical or do not differ more than 10% from each other; or comprising a mixture of such complexes.

Zakrewski, Yuri
Char, Fall
Stumpe, Joachim

JP2008509455A

October 27, 2010

May 04, 2006

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Fraunhofer Gesellschaft Tourer Feldernk Da Angewanten Forsunc A Fau

G03C1/73; G02B5/30; G03C1/74; G03C1/76

JP6012669A
JP2004110912A
JP2004040107A
JP2008511702A

US20050025422

Naoki Fukumura

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