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Title:
透明ガス遮断性フィルム、及びその製造方法
Document Type and Number:
Japanese Patent JP4583062
Kind Code:
B2
Abstract:

To provide a transparent gas barrier film which develops ultrahigh gas barrier properties and is enhanced in the adhesion of a transparent resin base material film 10 and a gas barrier layer, and its manufacturing method.

The transparent gas barrier film is constituted by providing one or a plurality of layers on one side of the transparent resin base material film 11 and the manufacturing method thereof has a wet heating process wherein water or a hydrophilic solvent is applied to or immersed in the transparent resin base material film 11 when at least one layer is formed and the coated or immersed transparent resin base material film is dried to be heated to 150°C or above. The transparent resin base material film 11 has a glass transition temperature Tg of 150-300°C and a hight transmissivity of 80% or above and a second transparent inorganic compound layer 13B has a surface roughness Ra (average roughness) of 5 nm or below and the Rmax (maximum roughness) of 120 nm or below.

COPYRIGHT: (C)2006,JPO&NCIPI


Inventors:
Yoshihiro Kishimoto
Application Number:
JP2004106533A
Publication Date:
November 17, 2010
Filing Date:
March 31, 2004
Export Citation:
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Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
B32B38/00; B32B9/00; G02F1/1333; C23C14/06; H01L51/50; H05B33/02; H05B33/14
Domestic Patent References:
JP2004001442A
JP2003191371A
JP2000111885A
JP2003260749A
Attorney, Agent or Firm:
Akihiko Yamashita
Kishimoto Tatsuto
Satoshi Kanayama