Title:
半導体装置の製造方法及び半導体装置用洗浄液
Document Type and Number:
Japanese Patent JP4583678
Kind Code:
B2
Inventors:
Yukio Takikawa
Mizushima Kenko
Mizushima Kenko
Application Number:
JP2001294802A
Publication Date:
November 17, 2010
Filing Date:
September 26, 2001
Export Citation:
Assignee:
富士通株式会社
International Classes:
H01L21/768; H01L21/304
Domestic Patent References:
| JP2000114368A | ||||
| JP10055993A | ||||
| JP11131093A | ||||
| JP2002289569A |
Foreign References:
| WO2000072363A1 | ||||
| WO2001036578A1 |
Attorney, Agent or Firm:
Keizo Okamoto