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Title:
フォトレジスト剥離剤組成物および該組成物を用いたフォトレジストの剥離方法
Document Type and Number:
Japanese Patent JP4608664
Kind Code:
B2
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Inventors:
Yasue Hidekuni
Takeshi Kotani
Yoshitaka Nishijima
Application Number:
JP2001079550A
Publication Date:
January 12, 2011
Filing Date:
March 19, 2001
Export Citation:
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Assignee:
Nagase Chemtex Co., Ltd.
International Classes:
G03F7/42; H01L21/027
Domestic Patent References:
JP2001005199A
JP2001209190A
JP2001350276A
JP2002072505A
Attorney, Agent or Firm:
Takuya Shindo



 
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