Title:
基板処理装置
Document Type and Number:
Japanese Patent JP4666494
Kind Code:
B2
Abstract:
A substrate treating apparatus for treating substrates with a treating liquid is disclosed. The apparatus includes a treating tank for storing the treating liquid, and treating the substrates as immersed in the treating liquid, a chamber surrounding the treating tank, a supply device for supplying an inert gas containing an organic solvent into the chamber, a lift mechanism vertically movable, while supporting the substrates, between a process position in the treating tank and a wait position above the treating tank and inside the chamber, a tank temperature control device for controlling temperature of the treating tank, a chamber temperature control device for controlling temperature of the chamber, and a control device for causing the tank temperature control device and the chamber temperature control device to perform heating treatment at least while the inert gas containing the organic solvent is supplied from the supply device.
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Inventors:
Tomoaki Aihara
Application Number:
JP2005335836A
Publication Date:
April 06, 2011
Filing Date:
November 21, 2005
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
| JP2003075067A | ||||
| JP11097409A | ||||
| JP7204592A | ||||
| JP11121429A | ||||
| JP8334235A | ||||
| JP2002317069A | ||||
| JP8264265A |
Attorney, Agent or Firm:
Tsutomu Sugiya