Title:
水素含有ラジカルによる未変性酸化物の洗浄
Document Type and Number:
Japanese Patent JP4673290
Kind Code:
B2
Abstract:
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.
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Inventors:
Wood, Bink, Sun
Kawaguchi, Mark, N.
Papanu, James, Es.
Mosselie, Rodarick, Sea.
Rye, Chikin, Stephen
Khao, Chen-Teu
Al, Hua
One, Way, W.
Kawaguchi, Mark, N.
Papanu, James, Es.
Mosselie, Rodarick, Sea.
Rye, Chikin, Stephen
Khao, Chen-Teu
Al, Hua
One, Way, W.
Application Number:
JP2006503556A
Publication Date:
April 20, 2011
Filing Date:
February 12, 2004
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/304; B08B5/02; C23C14/02; C23C14/06; H01J37/32; H01L21/00; H01L21/311; H01L21/3213; H01L21/768; H01L23/522; H01L21/306
Domestic Patent References:
| JP2001203194A | ||||
| JP9082689A | ||||
| JP8037176A | ||||
| JP10022279A | ||||
| JP5215064A | ||||
| JP2001500322A | ||||
| JP1290224A | ||||
| JP4206719A | ||||
| JP2002289596A | ||||
| JP2000150479A | ||||
| JP63224233A | ||||
| JP2002505804A | ||||
| JP2002500276A |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshiki Hasegawa
Ikeda adult
Yuichi Yamada
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshiki Hasegawa
Ikeda adult
Yuichi Yamada