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Title:
幾何光学収差を決定する方法
Document Type and Number:
Japanese Patent JP4690625
Kind Code:
B2
Abstract:
The invention relates to a method for determining geometrical-optical aberrations up to and including 3rd order in particle-optical, probe-forming systems, in particular scanning electron microscopes, comprising an essentially punctiform source, lenses, an object, and a detector, the image being recorded, the process being repeated with an overfocussed and an underfocussed beam, the images being transformed in Fourier space, the transformation of the overfocussed image, and the underfocussed image is divided by the transformed focussed image. The results are reverse transformed, and the brightness profiles of the probes, the images of the source, are determined in overfocus and underfocus. The asymmetry, the width and/or the curvature of the profile being determined in the center, and the image aberration being determined from the differences.

Inventors:
Tsaha Jokki
Application Number:
JP2001555115A
Publication Date:
June 01, 2011
Filing Date:
December 20, 2000
Export Citation:
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Assignee:
CEOS Corrected Electron Optical Systems GmbH
International Classes:
H01J37/153; G01Q30/02; H01J37/28
Domestic Patent References:
JP9082257A
JP6223761A
JP7220669A
JP9161706A
JP11145042A
JP10106469A
JP4341741A
JP2001516139A
Attorney, Agent or Firm:
Toshio Yano
Takuya Kuno
Einzel Felix-Reinhard