Title:
浸漬リソグラフィ・システムにおいて半導体基板を洗浄する方法及び装置
Document Type and Number:
Japanese Patent JP4763421
Kind Code:
B2
Abstract:
A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning mechanism within the immersion head of an immersion lithographic system or including a cleaning mechanism in a cleaning station of an immersion lithographic system.
Inventors:
Steve Jay Holmes
Mark Sea Haykey
Toshiharu Furukawa
David B. Hollac
Mark Sea Haykey
Toshiharu Furukawa
David B. Hollac
Application Number:
JP2005319160A
Publication Date:
August 31, 2011
Filing Date:
November 02, 2005
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2004289126A | ||||
| JP2004165666A |
Foreign References:
| WO2004053959A1 | ||||
| WO1999049504A1 | ||||
| WO2004053955A1 |
Attorney, Agent or Firm:
Takeshi Ueno
Tasaichi Tanae
Yoshihiro City
Hiroshi Sakaguchi
Tasaichi Tanae
Yoshihiro City
Hiroshi Sakaguchi